Cited Article: Holt JK. Fast mass transport through sub-2-nanometer carbon nanotubes
Alert Expires: 09 NOV 2010
Number of Citing Articles: 1 new records this week (1 in this e-mail)
Organization ID: 3b97d1bbc1878baed0ab183d8b03130b
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AU Bedewy, M
Meshot, ER
Guo, HC
Verploegen, EA
Lu, W
Hart, AJ
AF Bedewy, Mostafa
Meshot, Eric R.
Guo, Haicheng
Verploegen, Eric A.
Lu, Wei
Hart, A. John
TI Collective Mechanism for the Evolution and Self-Termination of
Vertically Aligned Carbon Nanotube Growth
SO JOURNAL OF PHYSICAL CHEMISTRY C
LA English
DT Article
ID HIGHLY EFFICIENT SYNTHESIS; CHEMICAL-VAPOR-DEPOSITION;
X-RAY-SCATTERING; CATALYST-SUPPORT; SUPER GROWTH; WATER; FORESTS;
KINETICS; STACKS; ARRAYS
AB We explain the evolution and termination of vertically aligned carbon
nanotube (CNT) "forests" by a collective mechanism, which is verified
by temporal measurements of forest mass and height, as well as
quantitative spatial mapping of CNT alignment by synchrotron X-ray
scattering. We propose that forest growth consists of four stages: (I)
self-organization; (II) steady growth with a constant CNT number
density; (III) decay with a decreasing number density; and (IV) abrupt
self-termination, which is coincident with a loss of alignment at the
base of the forest. The abrupt loss of CNT alignment has been observed
experimentally in many systems, yet termination of forest growth has
previously been explained using models for individual CNTs, which do
not consider the evolution of the CNT population. We propose that
abrupt termination of CNT forest growth is caused by loss of the
self-supporting structure, which is essential for formation of a CNT
forest in the first place, and that this event is triggered by
accumulating growth termination of individual CNTs. A finite element
model accurately predicts the critical CNT number density at which
forest growth terminates and demonstrates the essential role of
mechanical contact in maintaining growth of self-assembled films of
filamentary nanostructures.
C1 [Bedewy, Mostafa; Meshot, Eric R.; Guo, Haicheng; Lu, Wei; Hart, A. John] Univ Michigan, Dept Mech Engn, Ann Arbor, MI 48109 USA.
[Verploegen, Eric A.] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA.
RP Hart, AJ, Univ Michigan, Dept Mech Engn, 2350 Hayward St, Ann Arbor, MI
48109 USA.
EM ajohnh@umich.edu
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NR 52
TC 0
PU AMER CHEMICAL SOC; 1155 16TH ST, NW, WASHINGTON, DC 20036 USA
SN 1932-7447
DI 10.1021/jp904152v
PD DEC 3
VL 113
IS 48
BP 20576
EP 20582
SC Chemistry, Physical; Nanoscience & Nanotechnology; Materials Science,
Multidisciplinary
GA 522ZJ
UT ISI:000272038600009
ER
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