Friday, July 24, 2009

ISI Web of Knowledge Alert - Majumder M

ISI Web of Knowledge Citation Alert

Cited Article: Majumder M. Nanoscale hydrodynamics - Enhanced flow in carbon nanotubes
Alert Expires: 18 OCT 2009
Number of Citing Articles: 1 new records this week (1 in this e-mail)
Organization ID: 3b97d1bbc1878baed0ab183d8b03130b
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Title:
Effects of H-2 plasma pretreated Ni catalysts on the growth of carbon nanotubes

Authors:
Jian, SR

Author Full Names:
Jian, Sheng-Rui

Source:
MATERIALS CHEMISTRY AND PHYSICS 115 (2-3): 740-743 JUN 15 2009

Language:
English

Document Type:
Article

Author Keywords:
Multi-walled carbon nanotubes; H-2 pretreatment; Raman spectroscopy; Scanning electron microscopy; Transmission electron microscopy

KeyWords Plus:
CHEMICAL-VAPOR-DEPOSITION; RAPID GROWTH; ARRAYS; DENSITY; SENSORS; FLOW

Abstract:
Presented in this study are the effects of pretreatment temperature during H-2 plasma on synthesizing the multi-walled carbon nanotubes (MWCNTs) by using the microwave plasma chemical vapor deposition (MPCVD). A H-2 and CH4 gas mixture with a 9:1 ratio was used as a precursor for the synthesis of MW-NTs on Ni-coated TiN/Si (100) substrates. The structure and composition of Ni catalyst nanoparticles were investigated using scanning electron microscopy (SEM) and cross-sectional transmission electron microscopy (XTEM) techniques. The present findings showed that denser Ni catalyst nanoparticles and more vertically aligned MWCNTs could be effectively achieved at higher pretreatment temperature during H-2 plasma. The results of Raman spectra and TEM indicate that the morphologies of MWCNTs transform from amorphous carbon to a crystalline graphite structure or finite-sized graphite structure, depending on the pretreatment temperature during H-2 plasma. In addition. TEM results sug!
gest that H-2 plasma pretreatment can effectively reduce the amorphous carbon and carbonaceous particles. A decrease in the number of defects and optimized morphologies therefore is believed to play a significant role in improving the field-emission characteristics observed in the future. (C) 2009 Elsevier B.V. All rights reserved.

Reprint Address:
Jian, SR, I Shou Univ, Dept Mat Sci & Engn, Kaohsiung 840, Taiwan.

Research Institution addresses:
I Shou Univ, Dept Mat Sci & Engn, Kaohsiung 840, Taiwan

E-mail Address:
srjian@gmail.com

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Cited Reference Count:
30

Times Cited:
0

Publisher:
ELSEVIER SCIENCE SA; PO BOX 564, 1001 LAUSANNE, SWITZERLAND

Subject Category:
Materials Science, Multidisciplinary

ISSN:
0254-0584

DOI:
10.1016/j.matchemphys.2009.02.018

IDS Number:
467ZX

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